Location History:
- Santa Clara, CA (US) (2014)
- Dublin, CA (US) (2016 - 2018)
Company Filing History:
Years Active: 2014-2018
Title: Innovations by Inventor Chun Guan
Introduction
Chun Guan is a notable inventor based in Dublin, California. He has made significant contributions to the field of photolithography, particularly in monitoring photomask defectivity. With a total of 3 patents to his name, his work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Chun Guan's latest patents focus on innovative methods for monitoring changes in photomask defectivity. One of his patents describes a process where a reticle that meets specifications is inspected to generate baseline candidate defects, including their location and size. After the reticle is utilized in photolithography, it undergoes a subsequent inspection to identify current candidate defects. An inspection report is then generated, filtering candidate defects to include a first subset that does not match any baseline candidate defect's location and size, while excluding a second subset that does match.
Another patent by Chun Guan also addresses monitoring changes in photomask defectivity. This invention involves inspecting a reticle to generate a baseline event that indicates the location and size of unusual reticle features. Following its use in photolithography, the reticle is inspected again to generate current events for these features. The resulting inspection report includes a first subset of current events that do not match any baseline event's location and size, while excluding a second subset that does match.
Career Highlights
Chun Guan is currently employed at KLA-Tencor Corporation, a leading company in the semiconductor industry. His work at KLA-Tencor has allowed him to focus on enhancing the accuracy and reliability of photomask inspections, which are critical for the production of high-quality semiconductor devices.
Collaborations
Chun has collaborated with several talented individuals in his field, including Yalin Xiong and Joseph M. Blecher. These collaborations have contributed to the development of innovative solutions in photolithography and defect monitoring.
Conclusion
Chun Guan's contributions to the field of photolithography through his patents and work at KLA-Tencor Corporation highlight his role as an influential inventor. His innovative approaches to monitoring photomask defectivity continue to impact the semiconductor industry positively.