Chun-deuk Lee

Title: Innovations by Chun-deuk Lee in Semiconductor Technology

Introduction

Chun-deuk Lee is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist stripping methods. With a total of 4 patents to his name, Lee's work has advanced the fabrication processes used in semiconductor devices.

Latest Patents

One of Chun-deuk Lee's latest patents involves a method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide. This innovative method includes the steps of exposing and developing a photoresist deposited on a film of a semiconductor substrate. The process aims to remove selected portions of the photoresist, etch the exposed portions of the film, and subsequently remove any remaining photoresist using the specified stripping solutions. These solutions are effective in removing photoresists in both the Deep-UV group and the conventionally used photoresists in the I-line group.

Career Highlights

Chun-deuk Lee is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to focus on innovative solutions that enhance semiconductor manufacturing processes.

Collaborations

Lee has collaborated with several talented individuals in his field, including Mi-sook Jeon and June-ing Gil. These collaborations have contributed to the development of advanced technologies in semiconductor fabrication.

Conclusion

Chun-deuk Lee's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the methods used in semiconductor device fabrication, showcasing the importance of innovation in technology.