Yongin-si, South Korea

Chul Won Park

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chul Won Park. Retrieved from https://idiyas.com/inventor/chul-won-park-rkcarqgu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Chul Won Park: Innovator in Display Technology

Introduction

Chul Won Park is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Chul Won Park holds a patent for a display device and its manufacturing method. This invention includes a substrate, a conductive pattern layer, a buffer layer, an active pattern layer with a channel region and a conductive region, an insulating pattern layer, an oxide pattern layer, a gate electrode, and a connecting member. The connecting member and the oxide pattern layer are made from the same material, showcasing a unique approach to display device design. He has 1 patent to his name.

Career Highlights

Chul Won Park is currently employed at Samsung Display Co., Ltd., where he continues to work on advancing display technologies. His role at such a prominent company highlights his expertise and the value of his contributions to the industry.

Collaborations

Throughout his career, Chul Won Park has collaborated with talented individuals such as Jongdo Keum and Hyoung Do Kim. These partnerships have likely enriched his work and led to further innovations in display technology.

Conclusion

Chul Won Park is a distinguished inventor whose work in display technology has made a significant impact. His patent reflects his innovative spirit and dedication to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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