New Brunswick, NJ, United States of America

Chuiyuan Meng

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Rutgers, The State University of New Jersey. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chuiyuan Meng. Retrieved from https://idiyas.com/inventor/chuiyuan-meng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chuiyuan Meng: Innovator in Nanostructured Materials

Introduction

Chuiyuan Meng is a prominent inventor based in New Brunswick, NJ (US). He has made significant contributions to the field of nanotechnology, particularly through his innovative approaches to material production. His work focuses on the development of advanced materials that have a wide range of applications.

Latest Patents

Chuiyuan Meng holds a patent for a submerged-plasma process for the production of nanostructured materials. This patent describes a method for creating amorphous and nanocrystalline materials from precursors that can be either in liquid form or injected into the plasma. The versatility of this process allows for the production of materials with tailored properties, depending on the specific processing conditions.

Career Highlights

Chuiyuan Meng is affiliated with Rutgers, the State University of New Jersey, where he conducts research and development in the field of nanostructured materials. His work has garnered attention for its potential to revolutionize various industries by providing new materials with enhanced performance characteristics.

Collaborations

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Conclusion

Chuiyuan Meng's innovative work in the submerged-plasma process exemplifies the advancements being made in nanotechnology. His contributions are paving the way for new materials that could have a significant impact on various applications in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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