Shanghai, China

Chuchu Huang

This inventor holds 1 USPTO granted patent. Top assignee: Chinese Academy of Sciences. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chuchu Huang. Retrieved from https://idiyas.com/inventor/chuchu-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Chuchu Huang in Plasma-Atomic Emission Spectrum Technology

Introduction

Chuchu Huang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of plasma-atomic emission spectrum technology. His innovative work focuses on detecting heavy metal elements through advanced apparatus and methods.

Latest Patents

Chuchu Huang holds a patent for a solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction. This apparatus is designed for detecting heavy metal elements. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode, and a solution cathode. The hollow metal anode is connected to the positive electrode of the high-voltage power source via the ballast resistor, while the solution cathode connects to the negative electrode through a graphite electrode. The configuration allows for the formation of a discharge region between the hollow metal anode and the solution cathode, with the hollow metal anode also serving as a sample introduction pipeline. This design enables the gas to be detected to enter the discharge region and become excited.

Career Highlights

Chuchu Huang is affiliated with the Chinese Academy of Sciences, where he conducts his research and development work. His innovative approach has led to advancements in the detection of heavy metals, contributing to environmental safety and public health.

Collaborations

Chuchu Huang collaborates with esteemed colleagues, including Zheng Wang and Qing Li, who contribute to his research endeavors. Their combined expertise enhances the development of innovative technologies in their field.

Conclusion

Chuchu Huang's contributions to plasma-atomic emission spectrum technology exemplify the importance of innovation in detecting heavy metal elements. His work not only advances scientific understanding but also promotes environmental safety.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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