This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Sinyang Semiconductor Materials Co., Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Chuang Jiang - Innovator in Cleaning Agent Technology
Introduction
Chuang Jiang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of cleaning agents, particularly in semiconductor materials. His innovative approach has led to the development of a unique cleaning agent that addresses specific challenges in the industry.
Latest Patents
Chuang Jiang holds a patent for a cleaning agent and its preparation method and use. The cleaning agent is formulated from a combination of raw materials, including an oxidant containing iodine, an etchant containing boron, a pyrrolidinone solvent, a corrosion inhibitor, a metal ion-free surfactant, and water. The pH of the cleaning agent ranges from 7.5 to 13.5, ensuring its effectiveness in various applications. This cleaning agent is particularly efficient in removing nitrides from hard mask residues while minimizing effects on metals and low-k dielectric materials, showcasing its selectivity and effectiveness.
Career Highlights
Chuang Jiang is currently employed at Shanghai Sinyang Semiconductor Materials Co., Ltd. His work at this company has allowed him to focus on the development of advanced cleaning solutions for the semiconductor industry. His expertise and innovative mindset have positioned him as a key player in this field.
Collaborations
Chuang Jiang collaborates with talented individuals such as Su Wang and Qiangqiang Feng. Their combined efforts contribute to the advancement of cleaning agent technologies and enhance the overall research and development capabilities of their organization.
Conclusion
Chuang Jiang's contributions to the field of cleaning agents demonstrate his innovative spirit and commitment to advancing technology in the semiconductor industry. His patent reflects a significant step forward in creating effective cleaning solutions that meet industry demands.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile