Chuan Ren

Title: Chuan Ren: Innovator in Dummy Wafer Technology

Introduction

Chuan Ren is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of dummy wafer structures. His innovative approach addresses critical challenges in the polysilicon deposition process.

Latest Patents

Chuan Ren holds a patent for a "Dummy wafer structure and method of forming the same." This patent describes a dummy wafer structure that includes a silicon substrate, a silicon nitride layer over the silicon substrate, and a silicon dioxide layer over the silicon nitride layer. The method involves a two-step process: first, forming a silicon nitride layer over a silicon substrate, and second, forming a silicon dioxide layer over the silicon-silicon nitride structure. This unique structure helps avoid deposition rate inconsistencies and enhances the uniformity of deposit layers on process wafers.

Career Highlights

Chuan Ren is associated with Shanghai Huali Microelectronics Corporation, where he applies his expertise in semiconductor manufacturing. His work has been instrumental in improving the quality and consistency of semiconductor devices.

Collaborations

Chuan Ren collaborates with notable colleagues, including Zhi Jun Wang and Hsusheng Chang, who contribute to the advancement of technology in their field.

Conclusion

Chuan Ren's innovative work in dummy wafer technology exemplifies the importance of addressing challenges in semiconductor manufacturing. His contributions continue to influence the industry positively.