Chuan-Hui Lu

Title: Innovations of Chuan-Hui Lu in Semiconductor Manufacturing

Introduction

Chuan-Hui Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding two patents that showcase his expertise and innovative approach.

Latest Patents

Chuan-Hui Lu's latest patents include a method of manufacturing a semiconductor device. This method involves forming underlying structures comprising gate electrodes and source/drain epitaxial layers, followed by the creation of one or more layers over these structures. A hard mask layer is then formed, and a groove pattern is established within it. The process continues with the formation of one or more first resist layers and a first photo resist pattern, which are used to pattern the first resist layers and create a first hard mask pattern. This patterning allows for the hard mask layer with the groove pattern to be further refined, resulting in a second hard mask pattern.

Another notable patent is a method of manufacturing a semiconductor device by patterning a serpentine cut pattern. This method includes the formation of fins extending over a semiconductor substrate and the creation of a photoresist structure over these fins. The serpentine cut pattern is then patterned in the photoresist structure to form a cut mask, which is essential for the subsequent etching process.

Career Highlights

Chuan-Hui Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that enhance the efficiency and performance of semiconductor devices.

Collaborations

Chuan-Hui Lu has collaborated with notable colleagues such as Ming-Feng Shieh and Ming-Jhih Kuo. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Chuan-Hui Lu's contributions to semiconductor manufacturing through his patents reflect his dedication to innovation in the field. His work continues to influence the industry and pave the way for future advancements.