Chuan Chang

Title: The Innovations of Chuan Chang

Introduction

Chuan Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit. His work is primarily associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading player in the semiconductor industry.

Latest Patents

Chuan Chang's latest patents include a method for forming a fin field-effect transistor device. This method involves several intricate steps, such as forming a metal gate structure over a fin that protrudes above a substrate, surrounded by an interlayer dielectric (ILD) layer. The process includes recessing the metal gate structure, forming dielectric layers, and performing both dry and wet etch processes to create openings through the layers. This innovative approach enhances the performance and efficiency of semiconductor devices.

Career Highlights

Throughout his career, Chuan Chang has demonstrated a commitment to advancing semiconductor technology. His work at Taiwan Semiconductor Manufacturing Company Ltd. has positioned him as a key figure in the industry. His patents reflect his deep understanding of semiconductor fabrication processes and his ability to innovate within this complex field.

Collaborations

Chuan Chang has collaborated with notable colleagues, including Meng Jhe Tsai and Hong-Jie Yang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor community.

Conclusion

Chuan Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future advancements in semiconductor devices.