Chu-Fa Chan

Title: Innovations of Chu-Fa Chan in Plasma Processing Technology.

Introduction

Chu-Fa Chan is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing device that enhances the efficiency of various applications.

Latest Patents

Chu-Fa Chan holds a patent for a plasma processing device. This invention features an upper electrode and a lower electrode situated within a vacuum chamber. A chip is placed on the lower electrode, while a first plate with multiple first voids is positioned between the upper and lower electrodes. Additionally, a second plate with several second voids is placed between the first plate and the lower electrode. The device generates plasma using high-frequency power supplied by both electrodes, allowing for effective plasma filtration through the third void, first void, and second void.

Career Highlights

Chan is affiliated with Chang Gung University, where he continues to advance his research and development efforts. His work in plasma processing has garnered attention for its potential applications in various industries.

Collaborations

Some of his notable coworkers include Chi-Hsien Huang and Chao-Sung Lai, who contribute to the collaborative research environment at Chang Gung University.

Conclusion

Chu-Fa Chan's innovative contributions to plasma processing technology exemplify the impact of dedicated research and development in advancing scientific knowledge. His patent reflects a significant step forward in the field, showcasing the potential for future innovations.