Colorado Springs, CO, United States of America

Christopher Thistlethwaite

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Rockwell Collins, Inc.. Active years: 2024-2025.


% Patents Active = 100.0


Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Christopher Thistlethwaite: Innovator in Parachute Technology

Introduction

Christopher Thistlethwaite is a notable inventor based in Colorado Springs, CO. He has made significant contributions to the field of parachute technology, holding a total of 2 patents. His innovative designs focus on enhancing safety and functionality in parachute systems.

Latest Patents

Thistlethwaite's latest patents include a replaceable parachute container flap and a shock load attenuation device. The replaceable parachute container flap is designed to improve the retention system of parachutes. It features a container that can be attached to a vehicle, which holds the parachute securely. The flap includes a flexible barrier portion that encloses the container, ensuring the parachute remains in place. The shock load attenuation device incorporates crushable material and compartments that surround lines, allowing for effective force management during deployment.

Career Highlights

Christopher Thistlethwaite is currently employed at Rockwell Collins, Inc., where he continues to develop innovative solutions in aerospace technology. His work has contributed to advancements in safety and efficiency in parachute systems.

Collaborations

Thistlethwaite has collaborated with talented coworkers, including Andrew Shawver and Ronald John McCumber, to further enhance the development of parachute technologies.

Conclusion

Christopher Thistlethwaite's contributions to parachute technology through his patents and work at Rockwell Collins, Inc. highlight his commitment to innovation and safety in aerospace applications. His inventions are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
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