Christopher P Wright

Title: Christopher P Wright: Innovator in Ion Implantation Technology

Introduction

Christopher P Wright is a notable inventor based in West Sussex, GB. He has made significant contributions to the field of ion implantation technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of ion implanters, which are crucial in various applications, including semiconductor manufacturing.

Latest Patents

Wright's latest patents include an "Apparatus and method for improved scanning efficiency in an ion implanter." This invention involves an ion implanter designed to implant ions into a substrate. It features an ion beam generator, support means for carrying the substrate, and scanning means that allow for precise movement of the ion beam relative to the substrate. The system includes monitoring means to detect changes in the ion beam's cross-sectional area as it interacts with the substrate, ensuring optimal implantation.

Another significant patent is titled "Systems and methods for ion source control in ion implanters." This method focuses on operating an ion source with a filament-cathode and an anode. It involves supplying direct current electrical power while maintaining a constant arc current and varying the arc voltage on the filament-cathode. The method includes monitoring the arc voltage and adjusting the power supplied to the filament-cathode to maintain optimal performance.

Career Highlights

Christopher P Wright is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to further develop his innovative ideas and contribute to advancements in ion implantation technology.

Collaborations

Wright has collaborated with notable colleagues, including Frederick G Plumb and Nicholas J Bright. These collaborations have likely enhanced his research and development efforts, leading to impactful innovations in the industry.

Conclusion

Christopher P Wright is a distinguished inventor whose work in ion implantation technology has led to several important patents. His contributions continue to influence the field, showcasing the importance of innovation in advancing technology.