This inventor holds 1 USPTO granted patent. Top assignee: General Electric Company. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Christopher Mark Hartshorn: Innovator in Polymer Encapsulation
Introduction
Christopher Mark Hartshorn is an accomplished inventor based in Schenectady, NY (US). He is known for his innovative work in the field of polymer encapsulation, particularly focusing on high aspect ratio materials. His contributions to the industry have been recognized through his patent, which showcases his expertise and creativity.
Latest Patents
Hartshorn holds a patent titled "Polymer encapsulation of high aspect ratio materials and methods of making same." This invention involves a pigment that comprises one or more substantially spherical-shaped beads. Each bead contains high aspect ratio particles encapsulated within an encapsulating material. Additionally, the patent includes a resinous composition that incorporates this pigment and outlines a method for preparing the pigment via suspension polymerization. This innovative approach has the potential to enhance various applications in materials science.
Career Highlights
Christopher Mark Hartshorn is associated with General Electric Company, where he has made significant contributions to research and development. His work has not only advanced the understanding of polymer materials but has also paved the way for new applications in various industries. His dedication to innovation is evident in his patent and ongoing projects.
Collaborations
Throughout his career, Hartshorn has collaborated with talented individuals such as Daniel Steiger and Fazila Seker. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Christopher Mark Hartshorn is a notable inventor whose work in polymer encapsulation has made a significant impact in the field. His patent reflects his innovative spirit and commitment to advancing materials science. His contributions continue to inspire future developments in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
