Spokane, WA, United States of America

Christopher L Parfeniuk


Average Co-Inventor Count = 3.8

ph-index = 5

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2000-2005

Loading Chart...
6 patents (USPTO):Explore Patents

Title: Christopher L Parfeniuk: Innovator in Sputtering Technology

Introduction

Christopher L Parfeniuk is a notable inventor based in Spokane, WA (US). He has made significant contributions to the field of sputtering technology, holding a total of 6 patents. His work primarily focuses on the development of high-purity copper-containing sputtering targets, which are essential in various electronic applications.

Latest Patents

Among his latest patents is the invention of copper-containing sputtering targets and methods of forming these targets. The invention includes a sputtering target containing copper of a purity of at least about 99.999 wt. %, along with at least one component selected from a group that includes Ag, Sn, Te, In, B, Bi, Sb, and P dispersed within the copper. The total of these components within the copper ranges from at least 0.3 ppm to about 10 ppm. Additionally, the sputtering target is characterized by a substantially uniform grain size of less than or equal to about 50 micrometers throughout the copper and the at least one component.

Career Highlights

Christopher has worked with prominent companies such as Honeywell International Inc. and Johnson Matthey Electronics, Inc. His experience in these organizations has contributed to his expertise in the field of electronics and materials science.

Collaborations

Throughout his career, Christopher has collaborated with talented individuals, including Janine K Kardokus and Chi Tse Wu. These collaborations have likely enriched his work and led to innovative advancements in sputtering technology.

Conclusion

Christopher L Parfeniuk is a distinguished inventor whose work in sputtering technology has made a significant impact in the electronics industry. His innovative patents and collaborations reflect his commitment to advancing technology in this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…