This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.
Company Filing History:
1 out of 834,350 Years Active: 2004
Title: Christopher L McAdams: Innovator in Microlithography
Introduction
Christopher L McAdams is a notable inventor based in Chapel Hill, NC (US). He has made significant contributions to the field of microlithography, particularly through his innovative patent related to CO2-processes photoresists, polymers, and photoactive compounds.
Latest Patents
McAdams holds a patent for a process that involves forming a resist image in a microelectronic substrate. This process includes contacting the substrate with a composition that first comprises carbon dioxide and a component selected from a group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof. The method allows for the deposition of the component on the substrate to form a coating. The coating is then imagewise exposed to radiation, resulting in exposed and unexposed coating portions. Subsequently, the coating is subjected to a second composition comprising carbon dioxide, which enables the removal of either the exposed or unexposed coating portions, allowing the other coating portion to remain and form an image.
Career Highlights
Throughout his career, McAdams has demonstrated a commitment to advancing technology in the field of microelectronics. His innovative approach to utilizing carbon dioxide in photoresist processes has opened new avenues for research and development in microlithography.
Collaborations
Some of McAdams' notable coworkers include Jonathan L Kendall and Ruben Guillermo Carbonell. Their collaborative efforts have contributed to the advancement of technologies in their respective fields.
Conclusion
Christopher L McAdams is a distinguished inventor whose work in microlithography has made a lasting impact. His innovative patent showcases the potential of carbon dioxide in enhancing microelectronic processes.