Hawthorn, Australia

Christopher Charles Berndt

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Indian Institute of Technology Ropar, Swinburne University of Technology. Active years: 2020-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher Charles Berndt. Retrieved from https://idiyas.com/inventor/christopher-charles-berndt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Christopher Charles Berndt - Innovator from Hawthorn, AU

Introduction: Christopher Charles Berndt is a renowned inventor based in Hawthorn, Australia, known for his groundbreaking contributions to the field of materials science and engineering.

Latest Patents: Berndt holds several patents related to advanced coatings for industrial applications, including a recent patent for a novel heat-resistant coating material that has garnered significant attention in the aerospace industry.

Career Highlights: With a distinguished career spanning over two decades, Berndt has held key research positions at leading universities and research institutions, where he has led pioneering projects in the development of high-performance materials for extreme environments.

Collaborations: Throughout his career, Berndt has collaborated with industry leaders in aerospace, defense, and manufacturing sectors to translate his research findings into practical solutions. His collaborative efforts have resulted in the successful commercialization of several innovative technologies.

Conclusion: Christopher Charles Berndt's relentless pursuit of innovation and his passion for pushing the boundaries of materials science have established him as a prominent figure in the field, with a lasting impact on various industries worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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