Phoenix, AZ, United States of America

Christopher C Choffat


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Christopher C Choffat: Innovator in Semiconductor Cleaning Technology

Introduction

Christopher C Choffat is an accomplished inventor based in Phoenix, AZ (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of cleaning tools for semiconductor wafers. His innovative approach has led to the development of a unique cleaning device that enhances the efficiency of semiconductor manufacturing processes.

Latest Patents

Christopher C Choffat holds a patent for a "Brush for scrubbing semiconductor wafers." This tool is designed to clean semiconductor wafers effectively. It features a cleaning head with a flat face bounded by an edge, connected to a tubular drive shaft that allows cleaning fluid to flow through. The flat face includes an opening into the shaft and a series of channels that distribute the cleaning fluid evenly. The brush itself is made from a single piece of porous, elastic material, designed to securely attach to the cleaning head while providing optimal scrubbing action through its cylindrical nubs.

Career Highlights

Choffat is associated with Integrated Process Equipment Corporation, where he applies his expertise in semiconductor cleaning technologies. His work has been instrumental in advancing the tools used in semiconductor manufacturing, ensuring higher quality and efficiency in the production process.

Collaborations

One of his notable coworkers is Justin J Griffin, with whom he collaborates on various projects within the company. Their combined efforts contribute to the innovative solutions developed at Integrated Process Equipment Corporation.

Conclusion

Christopher C Choffat's contributions to semiconductor cleaning technology exemplify the impact of innovation in the industry. His patented brush design represents a significant advancement in the efficiency of semiconductor wafer cleaning processes.

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