Baie D'Urfe, Canada

Christopher Benn Agellon

This inventor holds 1 USPTO granted patent. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher Benn Agellon. Retrieved from https://idiyas.com/inventor/christopher-benn-agellon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Christopher Benn Agellon: Inventor of an Implantable Sensor Assembly

Introduction

Christopher Benn Agellon is an inventor associated with Baie-D’Urfé, Canada. His patent work includes an implantable sensor assembly designed to support and protect a sensor while allowing its sensing face to remain exposed.

Latest Patents

Agellon is credited with 1 patent: “Implantable Sensor Assembly Including a Sensor and a Compliant Structure.” The invention describes a support structure with a board, a compliant structure on the board’s top surface, and a sensor held above the board. An aperture in the support structure exposes at least part of the sensor’s face. In one example, the sensor is a pressure sensor whose sensing membrane is exposed through the aperture.

The assembly may also include a stiffener mounted beneath the board. A polymer shell with a conductive cover, or gel contained within a rigid cap, may protect the sensor and other components. An electrical connection between the conductive cover or cap and the conductive stiffener can form an electromagnetic shield.

Career Highlights

The patent reflects Agellon’s contribution to implantable sensor design, combining mechanical compliance, sensor exposure, protective packaging, and electromagnetic shielding in a single assembly.

Collaborations

Agellon’s listed coworkers include George Xereas and Charles Allan. Their names provide context for the professional relationships associated with his work.

Conclusion

Christopher Benn Agellon’s patented implantable sensor assembly brings together sensor support, protection, and shielding to address practical design considerations for implantable devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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