Company Filing History:
Years Active: 2013
Title: The Innovative Contributions of Christophe Desrumaux
Introduction
Christophe Desrumaux is a notable inventor based in La Buissiere, France. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the fabrication methods of semiconductor substrates, which are crucial for various electronic applications.
Latest Patents
Desrumaux holds a patent for a method of fabricating a semiconductor substrate. This invention involves providing a silicon on insulator type substrate that includes a base, an insulating layer, and a first semiconductor layer. The process includes doping the first semiconductor layer to create a modified layer and adding a second semiconductor layer with a different dopant concentration. This innovative method enhances the dopant concentration profile across the layers, making the substrates particularly suitable for optoelectronic applications.
Career Highlights
Christophe Desrumaux is associated with Soitec, a company known for its advancements in semiconductor materials. His work at Soitec has allowed him to contribute to cutting-edge technologies in the semiconductor industry. His expertise and innovative approach have positioned him as a valuable asset in his field.
Collaborations
Desrumaux has collaborated with notable colleagues, including Alexis Drouin and Bernard Aspar. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.
Conclusion
Christophe Desrumaux's contributions to semiconductor fabrication methods highlight his role as an influential inventor in the technology sector. His patent reflects a significant advancement that can enhance the performance of optoelectronic devices.