Moosach, Germany

Christoph Werner


Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 198(Granted Patents)


Location History:

  • Krailling, DE (1986 - 1995)
  • Moosach, DE (1996 - 1998)

Company Filing History:


Years Active: 1986-1998

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5 patents (USPTO):Explore Patents

Title: Christoph Werner: Innovator in Device Layer Technology

Introduction

Christoph Werner is a notable inventor based in Moosach, Germany. He has made significant contributions to the field of device layer technology, holding a total of 5 patents. His innovative approaches have advanced the methods used in the formation and deposition of multi-constituent device layers.

Latest Patents

One of Christoph Werner's latest patents is titled "Uniform distribution of reactants in a device layer." This patent describes a method and apparatus for forming a multi-constituent device layer on a wafer surface. The process involves flowing a first chemistry and a second chemistry via a segmented delivery system into a reaction chamber. The design of the segmented delivery system allows for a more uniform distribution of the first constituent within the device layer by effectively reducing the diffusion path.

Another significant patent is "Method for depositing a layer on a substrate wafer with a sputtering." This method employs a collimator with cylindrical holes to reduce the lateral component of a particle flux. The alignment of the cylindrical holes is crucial, as it ensures that they are perpendicular to the substrate wafer, optimizing the deposition process.

Career Highlights

Christoph Werner has worked with Siemens Aktiengesellschaft, a leading global technology company. His experience at Siemens has provided him with a solid foundation in the development of advanced technologies related to device layers.

Collaborations

Throughout his career, Christoph has collaborated with notable colleagues, including Matthias Ilg and Markus M Kirchhoff. These collaborations have contributed to the innovative advancements in his field.

Conclusion

Christoph Werner's contributions to device layer technology through his patents and career at Siemens highlight his role as a significant inventor in the industry. His work continues to influence the methods used in the formation and deposition of device layers, showcasing the importance of innovation in technology.

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