The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 1996

Filed:

Jul. 11, 1994
Applicant:
Inventors:

Christoph Werner, Moosach, DE;

Alfred Kersch, Munich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20429811 ;
Abstract

A method for depositing a layer on a substrate is disclosed wherein a collimator having cylindrical holes is employed to reduce the lateral component of a particle flux. The cylindrical holes are aligned to be perpendicular to a substrate wafer and have a variety of radii such that the hole radii are smaller in regions having a higher vertical component of particle flux than in regions which have a lower vertical component of the particle flux.


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