This inventor holds 4 USPTO granted patents and 3 published patent applications and 7 EPO patents. Top assignee: Sick Ag. Active years: 2012-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Freiburg, DE (2012 - 2013)
- Waldkirch, DE (2017)
Company Filing History:
Years Active: 2012-2017
Title: Christoph Märkle: Innovator in Sensor Technology
Introduction
Christoph Märkle is a notable inventor based in Freiburg, Germany. He has made significant contributions to the field of sensor technology, holding a total of 4 patents. His work focuses on developing innovative solutions that enhance object recognition and monitoring systems.
Latest Patents
Märkle's latest patents include a capacitive sensor for a roller and a method for recognizing objects at a roller track. This capacitive sensor is designed to detect objects located at a roller track by measuring capacitance changes between multiple measuring electrodes. Some of these electrodes are arranged to co-rotate with the roller, allowing for precise object recognition. Another patent involves a method and light sensor for the optical monitoring of a monitored zone. In this system, light is transmitted into the monitored area, and the reflected light is detected by two light receivers. These receivers produce output signals that are logically linked to determine the presence of objects within the monitored zone.
Career Highlights
Christoph Märkle is currently employed at Sick AG, a company renowned for its advancements in sensor technology. His work at Sick AG has allowed him to push the boundaries of innovation in this field.
Collaborations
Märkle collaborates with talented individuals such as Michael Klein and Bernhard Schindler, contributing to a dynamic and innovative work environment.
Conclusion
Christoph Märkle's contributions to sensor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in object recognition and monitoring systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
