Essen, Germany

Christoph Koopmann

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Degussa Aktiengesellschaft. Active years: 2004-2007.

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2004-2007

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2 patents (USPTO):Explore Patents

Title: Christoph Koopmann: Innovator in Chlorosilane Separation Technologies

Introduction

Christoph Koopmann is a notable inventor based in Essen, Germany. He has made significant contributions to the field of chemical engineering, particularly in the separation of chlorosilanes from gas streams. With a total of 2 patents, his work has implications for various industrial applications.

Latest Patents

Koopmann's latest patents focus on a novel process for the separation of chlorosilanes from gas streams. This innovative method involves treating the gas stream in two stages: first with water vapor in the gas phase, followed by treatment with a liquid, aqueous phase. This dual-stage process enhances the efficiency of chlorosilane removal, making it a valuable advancement in the industry.

Career Highlights

Christoph Koopmann is currently associated with Degussa Aktiengesellschaft, a leading company in the chemical sector. His expertise in chemical processes has positioned him as a key figure in the development of new technologies that improve industrial operations.

Collaborations

Throughout his career, Koopmann has collaborated with esteemed colleagues such as Hartwig Rauleder and Franz-Michael Bollenrath. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

In summary, Christoph Koopmann is a distinguished inventor whose work in chlorosilane separation processes has made a significant impact in the field of chemical engineering. His contributions continue to influence industrial practices and enhance operational efficiencies.

Profile summary based on public USPTO records.
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