Kiedrich, Germany

Christoph Brüning

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Schott Pharma Ag & Co Kgaa. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christoph Brüning. Retrieved from https://idiyas.com/inventor/christoph-brüning

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Christoph Brüning: Innovator in Substrate Technology

Introduction

Christoph Brüning is a notable inventor based in Kiedrich, Germany. He has made significant contributions to the field of substrate technology, particularly with his innovative patent that addresses the complexities of marking elements on substrates.

Latest Patents

Brüning holds a patent for a substrate that includes a marking element. The patent describes a substrate with a first surface area and a second surface area that has a different roughness value. The height profile of the substrate varies along a cutting line, with specific measurements defining a depth value. This innovative design allows for a ratio of the depth value and the second roughness value to be maintained between 2 and 35, enhancing the functionality of the substrate.

Career Highlights

Brüning is associated with Schott Pharma AG & Co. KGaA, where he applies his expertise in substrate technology. His work has been instrumental in advancing the capabilities of substrates used in various applications.

Collaborations

He collaborates with talented professionals such as Oliver Sohr and Stephan Corvers, contributing to a dynamic work environment that fosters innovation.

Conclusion

Christoph Brüning's contributions to substrate technology exemplify the impact of innovative thinking in the field. His patent reflects a deep understanding of material properties and their applications, marking him as a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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