Somerset, NJ, United States of America

Christine L Radich

This inventor holds 1 USPTO granted patent. Top assignee: Merck Sharp & Dohme LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christine L Radich. Retrieved from https://idiyas.com/inventor/christine-l-radich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Christine L. Radich and Her Patent on Nitrosamine Analysis.

Introduction

Christine L. Radich is an inventor associated with Somerset, New Jersey, and Merck Sharp & Dohme LLC. Her patent work addresses the sensitive detection of semi-volatile nitrosamines in solid samples.

Latest Patents

Radich is named on 1 patent: “Method for Analyzing Trace Levels of Semi-Volatile Nitrosamines in Solid Samples.” The invention describes preparing a sample and adding relevant chemicals to reduce or eliminate nitrosamine formation during analysis. It then uses full evaporation static headspace gas chromatography coupled with a nitrogen-phosphorus detector (FE-SHSGC-NPD) to analyze the gaseous phase. The method is designed to provide rapid, sensitive detection of semi-volatile nitrosamines, including NDMA.

Career Highlights

Radich’s patent reflects work on analytical methods for detecting trace chemical compounds. Her association with Merck Sharp & Dohme LLC connects this invention to research and development in the pharmaceutical industry.

Collaborations

Daniel E. Lee and Xinxin Han are identified as Radich’s coworkers. Their shared professional context at Merck Sharp & Dohme LLC provides a connection to the organization where her patented work is associated.

Conclusion

Christine L. Radich’s patent presents a method for rapidly and sensitively analyzing semi-volatile nitrosamines, including NDMA, in solid samples.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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