Redmond, WA, United States of America

Christina Yee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Meta Platforms Technologies, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christina Yee. Retrieved from https://idiyas.com/inventor/christina-yee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Christina Yee and an Adjustable Strap Design for Virtual-Reality Headsets.

Introduction

Christina Yee is an inventor based in Redmond, Washington. Her patent work includes a pulley-based adjustable strap design intended to help virtual-reality headset users achieve a comfortable fit across different head sizes.

Latest Patents

Yee is associated with 1 patent, titled “Pulley-Based Adjustable Strap Design for Virtual-Reality Headset.” The invention describes a head-wearable device with a display, a retractable side strap, and a housing containing an adjustment mechanism, an anchor point, and a cable. As the mechanism is adjusted, the cable winds or unwinds to change the exposed length of the strap. The design maintains cable tension and allows the headset to accommodate users with different head sizes.

Career Highlights

Yee is associated with Meta Platforms Technologies, LLC. Her patent reflects work on wearable-device design, particularly a mechanical adjustment system for improving headset fit.

Collaborations

The provided information lists Robert Coleman Skelton and Simon Morris Shand Weiss as Yee’s coworkers. Their inclusion indicates professional connections, but the available details do not specify their roles in the patent.

Conclusion

Christina Yee’s patent describes a cable-and-pulley adjustment system that varies a virtual-reality headset’s strap length, highlighting a practical approach to improving fit for wearable devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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