Christina Turley

Title: Christina Turley: Innovator in Semiconductor Technology

Introduction

Christina Turley is a prominent inventor based in Colchester, Vermont, known for her contributions to semiconductor technology. With a total of two patents to her name, she has made significant advancements in the field of extreme ultraviolet lithography.

Latest Patents

Her latest patents include a method for calculating non-correctable EUV blank flatness for blank dispositioning. This method focuses on semiconductor structures and involves determining a plane through the frontside and backside surfaces of a mask. It utilizes computing devices to find thickness variations and generate residual flatness measurements. Another notable patent is related to extreme ultraviolet lithography photomasks, which includes a reflective surface with a patterned design and a modified surface morphology to direct light away from subsequent mirrors.

Career Highlights

Christina works at GlobalFoundries Inc., a leading company in semiconductor manufacturing. Her innovative work has positioned her as a key player in the industry, contributing to advancements that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout her career, Christina has collaborated with notable colleagues such as Jed Hickory Rankin and Xuemei Chen, further enriching her contributions to the field.

Conclusion

Christina Turley's work in semiconductor technology exemplifies her dedication to innovation and excellence. Her patents reflect her expertise and commitment to advancing the industry.