Isla Vista, CA, United States of America

Christian Wurm


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Christian Wurm

Introduction

Christian Wurm is an accomplished inventor based in Isla Vista, California. He is known for his significant contributions to the field of materials science, particularly in the development of methods to control the relaxation of thick films on lattice-mismatched substrates. His innovative approach has implications for various applications in semiconductor technology.

Latest Patents

Wurm holds a patent titled "Method to control the relaxation of thick films on lattice-mismatched substrates." This patent describes a substrate comprising a III-N base layer with distinct portions, each having specific lattice constants and dislocation densities. The first III-N layer, which is thicker than 10 nm, has an indium fractional composition greater than 0.1. The patent outlines critical parameters, such as the strain-induced lattice constant and dislocation density, which are essential for optimizing the performance of the materials involved.

Career Highlights

Throughout his career, Christian Wurm has worked with prestigious institutions, including the University of California and the University of Michigan. His research has contributed to advancements in the understanding of lattice-mismatched substrates, which are crucial for the development of high-performance electronic devices.

Collaborations

Wurm has collaborated with notable colleagues, including Kamruzzaman Khan and Elaheh Ahmadi. Their combined expertise has fostered a productive research environment, leading to innovative solutions in the field of materials science.

Conclusion

Christian Wurm's work exemplifies the spirit of innovation in materials science. His patent and collaborations highlight his commitment to advancing technology in this critical area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…