This inventor holds 1 USPTO granted patent. Top assignees: Ims Ionen Mikrofabrikations Systeme Gesellschaft M.b.h., Oesterreichische Investitionskredit Aktiengesellschaft. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 8 
1 out of 3 Years Active: 1990
Title: The Innovative Mind of Christian Traher
Introduction
Christian Traher is a notable inventor based in Vienna, Austria. He has made significant contributions to the field of technology, particularly in the area of mask inspection for lithography processes. His innovative approach has led to the development of a unique apparatus that enhances the accuracy and efficiency of defect detection in lithography masks.
Latest Patents
Christian Traher holds a patent for an "Apparatus and method for inspecting a mask." This invention focuses on inspecting X-ray and corpuscular beam lithography masks for defects. The apparatus features a stage that supports the mask in the path of a corpuscular inspection beam projected from a beam source. It includes an emitter surface that emits secondary radiation resulting from the inspection beam's interaction with the mask. A detector captures this secondary radiation to generate image signals, which are then stored for comparison against a reference to detect defects. This innovative method allows for stepwise scanning of individual mask fields, ensuring thorough inspection and potential repair of detected defects.
Career Highlights
Throughout his career, Christian Traher has worked with several prominent companies, including Oesterreichische Investitionskredit Aktiengesellschaft and Ims Ionen Mikrofabrikations Systeme Gesellschaft M.b.h. His experience in these organizations has contributed to his expertise in the field of microfabrication and inspection technologies.
Collaborations
Christian has collaborated with notable professionals in his field, including Edward Wolf and Ernst Hammel. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Christian Traher's contributions to the field of mask inspection technology demonstrate his innovative spirit and commitment to advancing the industry. His patent reflects a significant step forward in ensuring the quality and reliability of lithography processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile