Limas, France

Christian Lucot

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Allnex Belgium S.a.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Lucot. Retrieved from https://idiyas.com/inventor/christian-lucot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0



Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Christian Lucot

Introduction

Christian Lucot is an accomplished inventor based in Limas, France. He has made significant contributions to the field of coatings and adhesives through his innovative methods. His work focuses on creating low extractable coatings that are essential for various applications.

Latest Patents

Christian Lucot holds a patent for a method of making low extractable coatings using radiation curable compositions containing aminoacrylates. This patent outlines a process for producing coatings, varnishes, adhesives, or inks that minimize extractable components, enhancing their performance and safety.

Career Highlights

Christian is associated with Allnex Belgium S.A., a company known for its expertise in specialty chemicals and coatings. His role at Allnex has allowed him to further develop his innovative ideas and contribute to the advancement of coating technologies.

Collaborations

Christian has collaborated with notable colleagues, including Vincent Stone and Francis Bergiers. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge solutions in the coatings industry.

Conclusion

Christian Lucot's contributions to the field of coatings through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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