Hausen, Germany

Christian Lebert

This inventor holds 1 USPTO granted patent and 2 published patent applications and 4 EPO patents. Top assignee: Maag Automatik Gmbh. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Lebert. Retrieved from https://idiyas.com/inventor/christian-lebert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Inventor Spotlight: Christian Lebert

Introduction: Christian Lebert is an innovative inventor based in Hausen, Germany. With a remarkable contribution to the field of technology, he holds a patent for a unique invention that addresses specific needs in various industries.

Latest Patents: Christian Lebert has been granted a patent for a curved filter screen. This inventive solution showcases his commitment to enhancing efficiency and effectiveness in filtration processes, making a significant impact in its respective applications.

Career Highlights: Christian works at Maag Automatik GmbH, an esteemed company known for its advanced automated solutions within the manufacturing sector. His role there allows him to apply his inventive skills and contribute to the company's technological advancements.

Collaborations: In his professional journey, Christian collaborates closely with his coworker, Harald Pohl. Together, they strive for excellence in innovation and development, sharing insights to push the boundaries of what is possible in their field.

Conclusion: Christian Lebert exemplifies the spirit of innovation and determination in his work. His patent for a curved filter screen not only highlights his inventiveness but also contributes positively to his company and the industry at large. Through collaboration and expertise, he continues to pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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