Deggendorf, Germany

Christian Kersehl

This inventor holds 1 USPTO granted patent. Top assignee: Max Streicher Gmbh & Co. Kg Aa. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Kersehl. Retrieved from https://idiyas.com/inventor/christian-kersehl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Christian Kersehl: Innovator in Drilling Technology

Introduction

Christian Kersehl is a notable inventor based in Deggendorf, Germany. He has made significant contributions to the field of drilling technology, particularly with his innovative designs that enhance efficiency and safety in drilling operations.

Latest Patents

Kersehl holds a patent for a drilling station, which is designed for use on a drilling platform. This invention features a drilling mast that, along with the energy supply and generating device for hydraulic energy, is composed of individual elements. Each of these elements has a mass that does not exceed a limit of 25 tons. The design emphasizes a joining process that requires no welding, utilizing quick connectors instead, which simplifies assembly and maintenance.

Career Highlights

Christian Kersehl is currently employed at Max Streicher GmbH & Co. KG AA, where he continues to develop innovative solutions in the drilling sector. His work is characterized by a commitment to improving the functionality and safety of drilling equipment.

Collaborations

Kersehl collaborates with esteemed colleagues such as Hans-Peter Murr and Georg Streicher, contributing to a dynamic team focused on advancing drilling technologies.

Conclusion

Christian Kersehl's contributions to drilling technology through his innovative patent demonstrate his expertise and commitment to enhancing industry standards. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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