Munich, Germany

Christian Ewertz

This inventor holds 1 USPTO granted patent. Top assignee: Mhp Management- Und It-Beratung Gmbh. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Ewertz. Retrieved from https://idiyas.com/inventor/christian-ewertz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Christian Ewertz: Innovator in Production Control Systems

Introduction

Christian Ewertz is a notable inventor based in Munich, Germany. He has made significant contributions to the field of production control systems. His innovative approach has led to the development of a unique system that enhances manufacturing efficiency.

Latest Patents

Ewertz holds a patent for a production control system. This system features an arrangement of manufacturer-specific modules, which include modules for controlling production units, logistics units, and processing product data. The proprietary data models of these modules are interconnected through at least one ontology unit. This innovation aims to streamline production processes and improve overall operational efficiency.

Career Highlights

Christian Ewertz is currently employed at MHP Management- und IT-Beratung GmbH. His role at the company allows him to apply his expertise in production control systems and contribute to various projects that enhance manufacturing processes.

Collaborations

Ewertz collaborates with talented professionals such as Martin Binder and Katharina Schubert. Their combined efforts foster a creative environment that drives innovation within their projects.

Conclusion

Christian Ewertz is a distinguished inventor whose work in production control systems exemplifies the impact of innovative thinking in manufacturing. His contributions continue to shape the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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