Buchkirchen, Austria

Christian Eder

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: O. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Eder. Retrieved from https://idiyas.com/inventor/christian-eder-siyg5vlc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Christian Eder

Introduction

Christian Eder is a notable inventor based in Buchkirchen, Austria. He has made significant contributions to the field of ski manufacturing through his innovative designs. His work exemplifies the spirit of creativity and technical expertise that drives advancements in the industry.

Latest Patents

Christian Eder holds a patent for a "Mold set for a ski press." This invention comprises a substructure with a base plate, a lower contour, and a lower heating element. Additionally, it features an upper structure that includes a cover plate, an upper contour, and an upper heating element. This design allows for a ski mold to be inserted between the substructure and the upper structure, enhancing the efficiency of ski production.

Career Highlights

Throughout his career, Christian has demonstrated a commitment to innovation and quality in ski manufacturing. His patent reflects his ability to identify challenges in the industry and develop practical solutions. Working at O, he has contributed to the advancement of ski technology, ensuring that products meet the demands of modern athletes.

Collaborations

Christian collaborates with Siegfried Rumpfhuber, who is also a key figure in the development of ski manufacturing technologies. Their partnership highlights the importance of teamwork in driving innovation.

Conclusion

Christian Eder's contributions to the ski manufacturing industry through his patent and collaborative efforts showcase his dedication to innovation. His work continues to influence the field, paving the way for future advancements in ski technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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