Darmstadt, Germany

Christian Eckhardt

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Roehm Gmbh. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Eckhardt. Retrieved from https://idiyas.com/inventor/christian-eckhardt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Christian Eckhardt: Innovator in Biaxial Forming Processes

Introduction

Christian Eckhardt is a notable inventor based in Darmstadt, Germany. He has made significant contributions to the field of polymer processing, particularly through his innovative approaches to forming techniques.

Latest Patents

Eckhardt holds a patent for a biaxial forming process for thick-walled acrylic sheets. This invention relates to a novel biaxial forming process for a preform made of a polymer material that includes polymethyl methacrylate. The patent also encompasses an apparatus for executing the process, as well as novel components derived from the biaxial forming process and their applications.

Career Highlights

Throughout his career, Christian Eckhardt has worked with prominent companies such as Röhm GmbH and Evonik Röhm GmbH. His experience in these organizations has allowed him to refine his expertise in polymer materials and processing techniques.

Collaborations

Eckhardt has collaborated with notable colleagues, including Wolfgang Stuber and Helmut Hilsmann. These partnerships have contributed to the advancement of his research and innovations in the field.

Conclusion

Christian Eckhardt's work in biaxial forming processes has made a significant impact on the polymer industry. His innovative patent and collaborations highlight his dedication to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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