Berlin, Germany

Christel Gehl

This inventor holds 2 USPTO granted patents. Top assignee: Siemens Aktiengesellschaft. Active years: 2000-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christel Gehl. Retrieved from https://idiyas.com/inventor/christel-gehl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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2 patents (USPTO):Explore Patents

Title: Christel Gehl: Innovator in Labeling Technology

Introduction

Christel Gehl is a prominent inventor based in Berlin, Germany. She has made significant contributions to the field of labeling technology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

One of her latest patents is a method and device for labeling flat items of post. This device applies labels to flat mail items using compressed air. The thickness and length of each item are determined in real-time, allowing for precise placement of the label based on the item's dimensions. Another notable patent is a device and process for measuring the rigidity of flat mail, which further demonstrates her commitment to enhancing postal technology.

Career Highlights

Christel Gehl is currently employed at Siemens Aktiengesellschaft, a leading global technology company. Her work at Siemens has allowed her to develop and refine her innovative ideas, contributing to advancements in the industry.

Collaborations

Throughout her career, Christel has collaborated with notable colleagues such as Georg Kinnemann and Juergen Reisig. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Christel Gehl's contributions to labeling technology and her innovative patents reflect her dedication to improving postal processes. Her work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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