Midland, MI, United States of America

Chris Windiate

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Dow Global Technolgoies LLC, Dow Silicones Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chris Windiate. Retrieved from https://idiyas.com/inventor/chris-windiate

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chris Windiate - Innovator in Silicone Technologies

Introduction: Chris Windiate is an accomplished inventor based in Midland, MI (US). He has made significant contributions to the field of silicone technologies through his work with notable companies such as Dow Global Technologies LLC and Dow Silicones Corporation. Although he currently holds no granted patents, his innovative spirit is evident in his latest patent applications.

Latest Patent Applications: Chris Windiate's recent patent applications include "Silicone Compositions and Their Applications." This application provides a method for applying an ablative coating using a one-part room temperature curable and sprayable silicone composition. The composition is designed to be thixotropic and cures within 24 hours, creating a thermal protective layer on various articles. Another application, "Preparation of Foamed Silicone Elastomers," details continuous methods for producing foamed silicone elastomers. The compositions used in this process include an organopolysiloxane with silicon-bonded unsaturated groups, an organohydrogensiloxane with silicon-bonded hydrogen atoms, a hydrosilylation catalyst, and a physical blowing agent.

Conclusion: Chris Windiate's work in silicone technologies showcases his innovative approach and dedication to advancing the field. His latest patent applications reflect his commitment to developing new materials and methods that can have a significant impact on various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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