Jiangsu, China

Chris Eichel

This inventor holds 2 USPTO granted patents. Top assignee: Globe (Jiangsu) Co., Ltd.. Active years: 2021-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chris Eichel. Retrieved from https://idiyas.com/inventor/chris-eichel-ag4qhlvq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2021-2022

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Chris Eichel: Innovator in Pressure Washer Technology

Introduction

Chris Eichel is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of technology, particularly with his innovative designs in pressure washing equipment. With a total of 2 patents to his name, Eichel continues to push the boundaries of engineering and design.

Latest Patents

Among his latest inventions are a pressure washer and an inverter. These products showcase his commitment to enhancing efficiency and performance in everyday tools. His work reflects a deep understanding of consumer needs and technological advancements.

Career Highlights

Eichel is currently employed at Globe (Jiangsu) Co., Ltd., where he applies his expertise to develop cutting-edge solutions. His role at the company allows him to collaborate with other talented engineers and contribute to innovative projects.

Collaborations

Some of his coworkers include Jiatao Li and Longfei Yang. Together, they form a dynamic team that fosters creativity and innovation within the company.

Conclusion

Chris Eichel's contributions to the field of technology, particularly in pressure washer design, highlight his innovative spirit and dedication to improving everyday tools. His work continues to inspire others in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…