Chorng-Ping Chang

Title: The Innovations of Chorng-Ping Chang

Introduction: Chorng-Ping Chang is a notable inventor based in Union County, NJ (US). He has made significant contributions to the field of integrated circuit technology. With a focus on enhancing device performance, his work has led to innovative solutions in semiconductor fabrication.

Latest Patents: One of his key patents is titled "Method of fabricating gate stack having a reduced height." This invention describes an integrated circuit device that features a reduced-height gate stack. The fabrication process involves using a patterned oxide hard mask to pattern the underlying metal layer. After the oxide mask is removed, the patterned metal serves as a mask to etch the polysilicon layer. This method improves the efficiency and performance of integrated circuits.

Career Highlights: Chorng-Ping Chang is currently employed at AT&T Corp. His work at the company has allowed him to apply his innovative ideas in practical applications. His patent demonstrates his expertise in semiconductor technology and his commitment to advancing the field.

Collaborations: Throughout his career, Chang has collaborated with talented individuals such as Kuo-Hua Lee and Chun-Ting Liu. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion: Chorng-Ping Chang's contributions to the field of integrated circuits exemplify the impact of innovation in technology. His patent for a method of fabricating gate stacks showcases his ability to solve complex engineering challenges. His work continues to influence the semiconductor industry and inspire future advancements.