Company Filing History:
Years Active: 2006-2015
Title: The Innovative Contributions of Choong-Ryul Ryou
Introduction
Choong-Ryul Ryou is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on methods that enhance the efficiency and precision of semiconductor devices.
Latest Patents
One of his latest patents is a method of forming a pattern in a semiconductor device. This method involves providing a substrate divided into cell and peripheral regions, followed by the formation of an object layer on the substrate. A buffer pattern is created on the object layer in the cell region along a first direction. A spacer is then formed along the sidewall of the buffer pattern in the cell region, while a hard mask layer remains on the object layer in the peripheral region. The buffer layer is subsequently removed, and the spacer is separated along a second direction, which is different from the first direction. This process results in the formation of a cell hard mask pattern and a peripheral hard mask pattern. Ultimately, a minute pattern is created using these hard mask patterns in the substrate, minimizing line width variation and edge line roughness due to the photolithography process.
Career Highlights
Choong-Ryul Ryou is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing processes.
Collaborations
He has collaborated with notable coworkers, including Hee-Sung Kang and Jin-Hua Liu, who have also made significant contributions to the field.
Conclusion
Choong-Ryul Ryou's work in semiconductor technology exemplifies the impact of innovation in enhancing manufacturing processes. His patents reflect a commitment to improving the efficiency and precision of semiconductor devices, making him a valuable contributor to the industry.