Athens, GA, United States of America

Choong K Rhee

This inventor holds 1 USPTO granted patent. Top assignee: University of Georgia Research Foundation Inc. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Choong K Rhee. Retrieved from https://idiyas.com/inventor/choong-k-rhee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1995

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Choong K Rhee in Semiconductor Technology

Introduction

Choong K Rhee is a notable inventor based in Athens, GA (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to digital electrochemical etching.

Latest Patents

Rhee holds a patent for a method titled "Digital electrochemical etching of compound semiconductors." This method involves an electrochemical flow cell system where alternating electrochemical potentials are applied between a reference electrode and the compound semiconductor. The process is designed to strip portions, preferably atomic layers, of the elements of compound semiconductors from the compound semiconductors. He has 1 patent to his name.

Career Highlights

Choong K Rhee is affiliated with the University of Georgia Research Foundation Inc., where he continues to advance research in semiconductor technologies. His work has implications for various applications in electronics and materials science.

Collaborations

Rhee has collaborated with esteemed colleagues, including John L Stickney and Qing Lei, contributing to the advancement of knowledge in his field.

Conclusion

Choong K Rhee's innovative work in digital electrochemical etching represents a significant advancement in semiconductor technology. His contributions continue to influence the field and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…