Company Filing History:
Years Active: 2009-2014
Title: Innovations of Choon-Goang Kim
Introduction
Choon-Goang Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing, with a focus on enhancing the efficiency and effectiveness of polishing apparatuses. His innovative work has led to the development of two patents that showcase his expertise and creativity.
Latest Patents
Choon-Goang Kim holds two patents that reflect his advancements in chemical mechanical polishing technology. The first patent is for "Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same." This invention includes a retainer ring with a base portion that has a ring shape, featuring a pressurizing surface and a combining surface. The design incorporates slurry inflowing portions with groove shapes and minute grooves to optimize the polishing process.
The second patent is titled "Chemical mechanical polishing devices, pad conditioner assembly and polishing pad conditioning method thereof." This invention describes a CMP device that planarizes a wafer by rotating a carrier with a mounted wafer over a polishing table while supplying slurry onto a polishing pad. The device includes a pad conditioner assembly that conditions the polishing pad by supplying a conditioning liquid and transferring megasonic vibrations to remove foreign substances.
Career Highlights
Choon-Goang Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and contribute to advancements in technology. His work at Samsung has positioned him as a key player in the development of cutting-edge polishing solutions.
Collaborations
Choon-Goang Kim has collaborated with notable colleagues, including Moo-yong Park and Tai-hyoung Kim. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Choon-Goang Kim's contributions to the field of chemical mechanical polishing are significant and impactful. His patents demonstrate his commitment to innovation and excellence in technology. His work continues to influence the industry and pave the way for future advancements.