Evanston, IL, United States of America

Chongyang Gao

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Adobe, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chongyang Gao. Retrieved from https://idiyas.com/inventor/chongyang-gao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations in Digital Image Editing by Chongyang Gao

Introduction

Chongyang Gao is an accomplished inventor based in Evanston, IL. He has made significant contributions to the field of digital image editing. His innovative approach leverages advanced techniques to enhance the editing process, making it more efficient and user-friendly.

Latest Patents

Chongyang Gao holds a patent for a groundbreaking method titled "Editing digital images based on masks." This patent describes a system that utilizes a computing device to implement an image combination process. The system receives a first digital image, a second digital image, a prompt for editing, and a mask that identifies a specific portion of the second image. By employing a machine learning model, the system determines which features from the second image to incorporate into the first image based on the provided prompt. The result is an edited digital image that seamlessly integrates the desired features, which is then presented in a user interface. He has 1 patent to his name.

Career Highlights

Chongyang Gao is currently associated with Adobe, Inc., a leading company in digital media and creativity software. His work at Adobe focuses on enhancing image editing capabilities, contributing to the development of tools that empower users to create stunning visuals.

Conclusion

Chongyang Gao's innovative work in digital image editing showcases his expertise and commitment to advancing technology in this field. His contributions are paving the way for more intuitive and powerful editing tools that benefit users worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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