Xi'an, China

Chong Ma


Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2022-2025

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Innovations of Chong Ma in Radio Frequency Technology

Introduction

Chong Ma is a notable inventor based in Xi'an, China. He has made significant contributions to the field of radio frequency technology, holding 2 patents that focus on improving processes in semiconductor manufacturing.

Latest Patents

Chong Ma's latest patents include "Methods and apparatus for controlling radio frequency electrode impedances in process chambers." This invention leverages an RF termination filter that provides an RF path to ground, enhancing the control of plasma in a process chamber. Another significant patent is "Methods and apparatus for zone control of RF bias for stress uniformity." This invention is designed to adjust film stress profiles on substrates, utilizing a PVD chamber with multiple electrodes to produce a more uniform film stress profile.

Career Highlights

Chong Ma is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative solutions that enhance manufacturing processes and improve product quality.

Collaborations

Chong has collaborated with notable coworkers such as Jian J Chen and Yi Yang, contributing to advancements in their shared field of expertise.

Conclusion

Chong Ma's innovative work in radio frequency technology demonstrates his commitment to advancing semiconductor manufacturing processes. His patents reflect a deep understanding of the complexities involved in this field, making him a valuable contributor to the industry.

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