Evanston, IL, United States of America

Chong Luo

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Northwestern University. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chong Luo. Retrieved from https://idiyas.com/inventor/chong-luo-f7qcqbur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Innovations of Chong Luo in Graphene Technology

Introduction

Chong Luo is an accomplished inventor based in Evanston, IL, known for his significant contributions to the field of graphene technology. With a total of two patents to his name, he has made strides in developing innovative cosmetic compositions and methods for reshaping graphene oxide-based structures.

Latest Patents

Chong Luo's latest patents include groundbreaking work on graphene-based multifunctional cosmetic compositions. These cosmetic compositions, which encompass hair coloring formulations, utilize graphene oxide (GO), reduced graphene oxide (r-GO), or both, combined with water. Additionally, he has developed methods for reshaping and bonding graphene oxide-based architectures. This method involves reshaping graphene oxide sheet-containing structures by applying force, followed by the application of liquid water to dissipate stress, allowing the structure to retain its new shape once the force is removed.

Career Highlights

Chong Luo is affiliated with Northwestern University, where he continues to advance research in graphene applications. His work not only enhances the understanding of graphene's potential but also paves the way for practical applications in various industries.

Collaborations

Chong Luo collaborates with notable colleagues, including Jiaxing Huang and Lingye Zhou, who contribute to the innovative research environment at Northwestern University.

Conclusion

Chong Luo's contributions to graphene technology exemplify the potential of innovative materials in cosmetic and structural applications. His patents reflect a commitment to advancing science and technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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