This inventor holds 1 USPTO granted patent. Top assignees: Centre National De La Recherche Scientifique, Cpe Lyon Formation Continue Et Recherche - Cpe Lyon Cfr, Elkem Silicones France Sas. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2024
Title: Chlóe Thieuleux: Innovator in Nanoparticle Technology
Introduction
Chlóe Thieuleux is a notable inventor based in Villeurbanne, France. He has made significant contributions to the field of nanoparticle technology, particularly in the development of catalysts for chemical reactions. His innovative work has led to the creation of a unique patent that showcases his expertise and creativity.
Latest Patents
Chlóe Thieuleux holds a patent for "Nanoparticles of co complexes of zero-valent metals that can be used as hydrosilylation and dehydrogenative silylation catalysts." This patent describes nanoparticles that contain at least one transition metal with an oxidation state of 0, selected from the metals of columns 8, 9, and 10 of the periodic table, along with at least one carbonyl ligand, preferably a silicide. This invention has the potential to advance the efficiency of various chemical processes.
Career Highlights
Throughout his career, Chlóe has worked with prominent organizations such as Elkem Silicones France SAS and Université Claude Bernard Lyon I. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in the field of materials science.
Collaborations
Chlóe Thieuleux has collaborated with esteemed colleagues, including Valérie Meille and Laurent Veyre. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chlóe Thieuleux is a distinguished inventor whose work in nanoparticle technology has made a significant impact in the field. His patent for innovative catalysts demonstrates his commitment to advancing scientific knowledge and practical applications. His contributions continue to inspire future research and development in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile