Location History:
- Calais, FR (2008 - 2009)
- Villeurbanne, FR (2022)
Company Filing History:
Years Active: 2008-2022
Title: Chloé Thieuleux: Innovator in Crystalline Thin Films and Hybrid Materials
Introduction
Chloé Thieuleux is a prominent inventor based in Calais, France. He has made significant contributions to the fields of materials science and engineering, particularly in the development of innovative methods for creating crystalline thin films and mesoporous organic-inorganic hybrid materials. With a total of 3 patents to his name, Thieuleux's work has garnered attention for its potential applications in various industries.
Latest Patents
Thieuleux's latest patents include a method of forming a crystalline thin film using an atomic layer deposition (ALD)-formed amorphous thin film as a precursor. This method involves preparing an amorphous film by depositing metal and element precursors, followed by annealing at high temperatures to achieve the desired crystalline structure. Another notable patent focuses on the preparation of mesoporous organic-inorganic hybrid materials designed for gas separation. This invention utilizes controlled porosity and functionality through hydrolysis and condensation polymerization, resulting in materials that can effectively separate gases.
Career Highlights
Throughout his career, Chloé Thieuleux has worked with esteemed organizations such as the Centre National de la Recherche Scientifique and the Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His research has contributed to advancements in material science, particularly in the synthesis and application of hybrid materials.
Collaborations
Thieuleux has collaborated with notable colleagues, including Robert J. Corriu and Ahmad Mehdi. These partnerships have further enriched his research and innovation efforts, leading to impactful developments in his field.
Conclusion
Chloé Thieuleux stands out as an influential inventor whose work in crystalline thin films and hybrid materials has the potential to revolutionize various applications. His contributions continue to inspire advancements in material science and engineering.
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