Company Filing History:
Years Active: 1999-2007
Title: Innovations of Chiwoei Wayne Lo
Introduction
Chiwoei Wayne Lo is a prominent inventor based in Campbell, California. He holds a total of 14 patents, showcasing his significant contributions to the field of semiconductor technology. His work primarily focuses on methods and apparatuses that enhance the capabilities of charged particle beam tools.
Latest Patents
One of his latest patents is titled "Method and apparatus for multiple charged particle beams." This invention involves a multi-charged particle beam tool designed for semiconductor wafer inspection or lithography. The tool features an array of electron beam columns, each equipped with its own electron or ion source. The objective lenses of these columns share a common magnetic coil, which generates a uniform magnetic field, improving beam spacing and optical properties. Additionally, when used as an inspection tool, each column has its own detector to identify secondary and back-scattered electrons from the wafer under inspection. Another notable patent is "Detection of defects in patterned substrates." This method involves positioning a charged-particle-beam optical column relative to a patterned substrate and acquiring images to identify defects by comparing them to a reference.
Career Highlights
Chiwoei Wayne Lo has worked with several notable companies, including Applied Materials, Inc. and Schlumberger Technologies, Inc. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.
Collaborations
Throughout his career, Chiwoei has collaborated with talented individuals such as Christopher G. Talbot and Kenichi Kanai. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Chiwoei Wayne Lo's innovative patents and career achievements highlight his significant impact on semiconductor technology. His work continues to influence the industry and pave the way for future advancements.