This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2013.
Company Filing History:
Years Active: 2013
Title: Innovations of Chiunn-Wen Chen
Introduction
Chiunn-Wen Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of reactive silicon dioxide compounds. His work has implications for various applications, including optical protective films.
Latest Patents
Chiunn-Wen Chen holds a patent for a reactive silicon dioxide compound and an optical protective film containing the same. The formula of the reactive silicon dioxide compound is represented as Formula (I), where each R is a reactive group shown as Formula (II) or Formula (III). The variable R can include H or CH, and n is an integer ranging from about 1 to 6, while m is an integer from about 0 to 4. This innovation showcases his expertise in creating advanced materials for protective applications.
Career Highlights
Chiunn-Wen Chen is affiliated with the Industrial Technology Research Institute, where he has been instrumental in research and development projects. His work has not only advanced the field but has also contributed to the institute's reputation as a leader in technological innovation.
Collaborations
Chiunn-Wen Chen has collaborated with esteemed colleagues, including Te-Yi Chang and Ming-Tzung Wu. These partnerships have fostered a collaborative environment that enhances the research output and innovation potential within their projects.
Conclusion
Chiunn-Wen Chen's contributions to the field of materials science, particularly through his patent on reactive silicon dioxide compounds, highlight his role as an influential inventor. His work continues to impact the development of advanced optical materials.