Company Filing History:
1 out of 16,080 
1 out of 832,812 Years Active: 1997-2008
Title: Innovations of Chiu-Fu Cheng
Introduction
Chiu-Fu Cheng is an accomplished inventor based in Picayune, MS (US). He has made significant contributions to the field of environmental science through his innovative patents. With a total of 2 patents, Cheng has focused on developing methods and systems that enhance our understanding of water properties and improve satellite imaging techniques.
Latest Patents
Cheng's latest patents include a "System and method for extracting optical properties from environmental parameters in water." This invention predicts water clarity at various depths by utilizing a neural network trained on water measurements. The system incorporates inputs such as temperature, salinity, tidal information, water depth, and sediment data. Additionally, it features algorithms that operate under different weather conditions to ensure accurate predictions.
Another notable patent is the "Apparatus and method for cloud masking." This invention addresses the challenge of collecting satellite images of water bodies while removing cloud interference. By employing local segmentation techniques, the apparatus effectively discriminates between cloud-free and cloud-contaminated pixels, enhancing the accuracy of satellite imagery.
Career Highlights
Throughout his career, Chiu-Fu Cheng has worked with various organizations, including the United States Navy. His expertise in environmental parameters and satellite imaging has positioned him as a valuable contributor to advancements in these fields.
Collaborations
Cheng has collaborated with notable colleagues such as Sonia C Gallegos and Ronald J Holyer. Their combined efforts have furthered research and development in environmental science and technology.
Conclusion
Chiu-Fu Cheng's innovative work in environmental science and satellite imaging demonstrates his commitment to advancing technology for better understanding and monitoring of water properties. His contributions through patents reflect a dedication to improving accuracy in environmental assessments.